The VarioS®-Microscanner-Configurator is a tool to individually configure microscanner demonstrators based on the VarioS®-Microscanner-construction-kit and to verify the technical feasibility. Individually configurable parameters are mirror diameter, scan frequency, maximum mirror deflection and max. dynamic deformation by means of root mean square(RMS)of the mirror plates deflection field. In addition the scanner-configurator can be used to request a quotation for verified microscanner designs via an email form.
The following section provides a brief description of the design parameters, technical and physical restrictions and help for navigating the design space.
The configurability of VarioS®-Microscanners is restricted by physical and technical criteria. Only a certain set of combinations are available for designing a scanner demonstrator - the so called design space. Accordingly, some configurations will not be available on request - in this case, the configuration that is closest to the requested parameter set is provided.
Please note that the design space mapped by the VarioS®-Microscanner-configurator is based on our standard technology and standard design only. In case the VarioS®-microscanner-configurator does not offer the requested configuration please feel free to contact us for more detailed information on further options!
For different types of demonstrators, different design spaces exist. For these, the design parameters are correlated and the correlations are in parts nonlinear. Therefore the VarioS® designspace has a complex shape. In addition the hull of the designspace can be variant to the requirement on mirror planarity during operation. - To make navigation throughout the design space as simple as possible we have created design space maps for 1D and 2D demonstrators: Design-Space 1D Design-Space 2D
On a grid, defined by scan frequency and mirror diameter, level curves indicate the maximum mirror deflection at the related grid point. For the design space maps, a maximum RMS value of the dynamic deformation field of less then 32 nm is assumed.
Microscanners described on this website are fabricated with a modular bulk micromachining process. The masks used for the lithography steps are constructed as a modular system. With a basic set of masks a great variety of demonstrators can be fabricated and substrates are prefabricated to reduce delivery time. The prefabricated substrates imply restrictions on the available mirror diameter. See the product info page for details on available diameters.↑
The offered microscanners are operated resonantly only. This means the mirror is excited to oscillate at a given mechanical resonance frequency. Thus the scan frequency is correlated with the mirror's mass and the elasticity of the mirror's flexible support structures. Restrictions result from:
Higher mirror deflection requires high electrostatic forces and accordingly high drive voltage. It also produces high material stress in the mirror support structures. Restrictions result especially from:
Due to inertial forces mirror plates deform elastically during operation. The deformation is quantified by means of the root mean square (RMS) of the dynamic deformation field in respect to the undeformed mirror plate at maximum mirror deflection (see Product Info). Please note that at this point the deformation is maximum. The dynamic deformation can be decreased by reduction of mirror diameter, scan frequency and maximum mirror deflection.
© 2018 Fraunhofer IPMS
last modified : 2018-06-26